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Optical Engineering

Transferring resist microlenses into silicon by reactive ion etching
Author(s): Martin Eisner; Johannes Schwider
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Paper Details

Date Published: 1 October 1996
PDF: 4 pages
Opt. Eng. 35(10) doi: 10.1117/1.600981
Published in: Optical Engineering Volume 35, Issue 10
Show Author Affiliations
Martin Eisner, Univ. Erlangen-Nuernberg (Switzerland)
Johannes Schwider, Univ. Erlangen-Nuernberg (Germany)

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