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Optical Engineering

KrF excimer laser lithography with a phase-shifting mask for gigabit-scale ultra large scale integration
Author(s): Akira Imai; Tsuneo Terasawa; Norio Hasegawa; Naoko Asai; Toshihiko P. Tanaka; Shinji Okazaki
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Paper Details

Date Published: 1 October 1996
PDF: 9 pages
Opt. Eng. 35(10) doi: 10.1117/1.600980
Published in: Optical Engineering Volume 35, Issue 10
Show Author Affiliations
Akira Imai, Hitachi, Ltd. (Japan)
Tsuneo Terasawa, Hitachi, Ltd. (Japan)
Norio Hasegawa, Hitachi, Ltd. (Japan)
Naoko Asai, Hitachi, Ltd. (Japan)
Toshihiko P. Tanaka, Hitachi, Ltd. (Japan)
Shinji Okazaki, Hitachi, Ltd. (Japan)


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