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Optical Engineering

Design of high-voltage and high-brightness pseudospark-produced electron beam source for a Raman free-electron laser
Author(s): Junbiao Zhu; Ming C. Wang; Zhijiang Wang; J. K. Lee
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Paper Abstract

The design of a pseudospark chamber, a high-voltage (<100 kV), high-current density, low-emittance and high-brightness electron beam source which can provide high-quality beams for free-electron lasers (FELs), driven by a modified pulse line accelerator, is presented. Based on the hollow cathode (HC) effect and the pseudospark (PS) empirical formula, the HC parameters, the cathode-anode separation, and the working gas pressure region are determined. The general experimental setup of the high-brightness PS-produced electron beam source is shown.

Paper Details

PDF: 4 pages
Opt. Eng. 35(2) doi: 10.1117/1.600922
Published in: Optical Engineering Volume 35, Issue 2, February 1996
Show Author Affiliations
Junbiao Zhu, Institute of High Energy Physics (China)
Shanghai Institute of Optics and Fine Mechanics (China)
Ming C. Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Zhijiang Wang, Shanghai Institute of Optics and Fine Mechanics (United States)
Apollo Instruments, Inc. (United States)
J. K. Lee, Pohang Univ. of Science and Technology (South Korea)

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