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Optical Engineering

Proximity correction for electron beam lithography
Author(s): Christie R. Marrian; Steven Chang; Martin C. Peckerar
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Paper Details

Date Published: 1 September 1996
PDF: 8 pages
Opt. Eng. 35(9) doi: 10.1117/1.600846
Published in: Optical Engineering Volume 35, Issue 9
Show Author Affiliations
Christie R. Marrian, Naval Research Lab. (United States)
Steven Chang, Dept. of Defense (United States)
Martin C. Peckerar, Naval Research Lab. (United States)


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