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Optical Engineering

Characterization of homogeneous and inhomogeneous Si-based optical coatings deposited in dual-frequency plasma
Author(s): Daniel Poitras; Pierre Leroux; Jolanta Ewa Klemberg-Sapieha; Subhash C. Gujrathi; Ludvik Martinu
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Paper Abstract

Silicon-compound optical coatings (silicon nitride, dioxide, oxynitrides) were prepared by plasma-enhanced chemical vapor deposition (PECVD) at near-ambient substrate temperature from SiH4/N2O/NH3 mixtures, using a dual-mode microwave/radiofrequency plasma system. The refractive index profile of the films was adjusted with depth in two ways: (1) between 1.45 (SiO2) and 1.90 (SiN1.3) by varying the N2O/NH3 feed gas ratio, and (2) between 1.65 and 1.90 for SiN1.3 films, by increasing the energy of bombarding ions from 5 eV to 400 eV. The film composition was changed either abruptly (multilayers) or continuously (graded-index, inhomogeneous layers). The resulting optical properties are correlated with the depth profile analysis of the chemical composition, and with mechanical characteristics such as adhesion, stress, and scratch resistance.

Paper Details

Date Published: 1 September 1996
PDF: 7 pages
Opt. Eng. 35(9) doi: 10.1117/1.600833
Published in: Optical Engineering Volume 35, Issue 9
Show Author Affiliations
Daniel Poitras, Ecole Polytechnique de Montreal (Canada)
Pierre Leroux, MicroPhotonics Inc. (United States)
Jolanta Ewa Klemberg-Sapieha, Ecole Polytechnique de Montreal (Canada)
Subhash C. Gujrathi, Univ. de Montreal (Canada)
Ludvik Martinu, Ecole Polytechnique de Montreal (Canada)

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