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Optical Engineering

Twofold increase in sensitivity with a dual-beam illumination arrangement for electronic speckle pattern interferometry
Author(s): Alexander Sohmer; Charles Joenathan
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Paper Details

Date Published: 1 July 1996
PDF: 6 pages
Opt. Eng. 35(7) doi: 10.1117/1.600770
Published in: Optical Engineering Volume 35, Issue 7
Show Author Affiliations
Alexander Sohmer, Rose-Hulman Institute of Technology (Germany)
Charles Joenathan, Rose-Hulman Institute of Technology (United States)

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