Share Email Print
cover

Optical Engineering

Twofold increase in sensitivity with a dual-beam illumination arrangement for electronic speckle pattern interferometry
Author(s): Alexander Sohmer; Charles Joenathan
Format Member Price Non-Member Price
PDF $20.00 $25.00

Paper Abstract

A modification of a dual-beam illumination arrangement for electronic speckle pattern interferometry (ESPI) that leads to a twofold increase in the sensitivity to in-plane displacements is described. For each of the two illumination beams, the scattered light is observed along the direction of illumination, and these two components of the scattered light are then combined. The error in perspective caused by oblique observation can be almost corrected for by using two right-angle prisms in front of the object being studied. Experimental results including phasestepping are presented and compared with the results predicted by theory.

Paper Details

Date Published: 1 July 1996
PDF: 6 pages
Opt. Eng. 35(7) doi: 10.1117/1.600770
Published in: Optical Engineering Volume 35, Issue 7
Show Author Affiliations
Alexander Sohmer, Rose-Hulman Institute of Technology (Germany)
Charles Joenathan, Rose-Hulman Institute of Technology (United States)


© SPIE. Terms of Use
Back to Top