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Optical Engineering

Laser ablation in a reactive atmosphere: application to the synthesis and deposition performance of titanium carbide thin films
Author(s): Ion N. Mihailescu; Eniko Gyorgy; Mihai A. Popescu; Sebastian M. Csutak; Gheorghe Marin; Valentin S. Teodorescu; Ioan Ursu; Armando Luches; Maurizio Martino; Alessio Perrone; Joerg Hermann
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Paper Abstract

We report the synthesis and deposition of Ti carbide thin layers by multipulse excimer laser ablation of Ti targets in CH4 at low ambient pressure (in the microbar range). The layers deposited on singlecrystalline Si wafers are characterized by optical microscopy, scanning electron microscopy, x-ray diffraction, photoelectron spectroscopy, and spectroscopic ellipsometry. We obtained deposition rates in the range 0.2 to 0.3 Å/pulse for a target-collector separation distance of 12.5 mm. The deposition parameters were found to be in good agreement with the predictions of the theoretical model based on the assumption of the adiabatic expansion of the plasma in the ambient gas.

Paper Details

Date Published: 1 June 1996
PDF: 4 pages
Opt. Eng. 35(6) doi: 10.1117/1.600732
Published in: Optical Engineering Volume 35, Issue 6
Show Author Affiliations
Ion N. Mihailescu, Institute of Atomic Physics (Romania)
Eniko Gyorgy, Institute of Atomic Physics (Romania)
Mihai A. Popescu, Central Institute of Physics (Romania)
Sebastian M. Csutak, Institute of Atomic Physics (United States)
Gheorghe Marin, Institute of Atomic Physics (Romania)
Valentin S. Teodorescu, Central Institute of Physics (Romania)
Ioan Ursu, Central Institute of Physics (Romania)
Armando Luches, Univ. di Lecce (Italy)
Maurizio Martino, Univ. di Lecce (Italy)
Alessio Perrone, Univ. di Lecce (Italy)
Joerg Hermann, Univ. d'Orleans (France)

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