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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Analytic form for the power spectral density in one, two, and three dimensions
Author(s): Chris A. Mack

Paper Abstract

Analytical expressions for the power spectral density (PSD) are often useful in stochastic lithography simulation and the metrology of roughness. Using a common stretched exponential correlation function with three parameters (standard deviation, correlation length, and roughness exponent), the PSD can be computed as the Fourier transform of the autocorrelation function. For the special cases of roughness exponent equal to 0.5 and 1, the PSD can be computed analytically for one, two, and three dimensions. In this paper, the analytical results of these calculations are given. The resulting equations can be used when modeling rough lines, surfaces, or volumes.

Paper Details

Date Published: 1 October 2011
PDF: 3 pages
J. Micro/Nanolith. 10(4) 040501 doi: 10.1117/1.3663567
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 10, Issue 4
Show Author Affiliations
Chris A. Mack, lithoguru.com (United States)


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