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Journal of Micro/Nanolithography, MEMS, and MOEMS

Wavefront-based pixel inversion algorithm for generation of subresolution assist features
Author(s): Jue-Chin Yu; Peichen Yu; Hsueh-Yung Chao
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Paper Abstract

The generation of subresolution assist features (SRAFs) using inverse-lithography techniques demands extensive computational resources which limits its deployment in advanced CMOS nodes. In this paper, we propose a wavefront-based pixel inversion algorithm to quickly obtain inverse masks with a high aerial image quality. Further assisted by a flexible pattern simplification technique, we present effective SRAF generation and placement based on the calculated inverse mask. The proposed approach can be easily inserted prior to a conventional mask correction flow for subsequent concurrent optimizations of both drawn patterns and SRAFs. The innovative pixel inversion and pattern simplification techniques allow quality mask corrections as produced by inverse lithography while maintaining the convenience of standardized/validated process flows currently used in the industry.

Paper Details

Date Published: 1 October 2011
PDF: 13 pages
J. Micro/Nanolith. 10(4) 043014 doi: 10.1117/1.3663249
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 10, Issue 4
Show Author Affiliations
Jue-Chin Yu, National Chiao Tung Univ. (Taiwan)
Peichen Yu, National Chiao Tung Univ. (Taiwan)
Hsueh-Yung Chao, ANSYS, Inc. (United States)


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