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Journal of Micro/Nanolithography, MEMS, and MOEMS

Highly sensitive and fast scanner focus monitoring method using forbidden pitch pattern
Author(s): Jinseok Heo; Jeong-Ho Yeo; Young-Hee Kim
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Paper Abstract

Forbidden pitches that are introduced under certain illumination conditions can have extremely narrow depth of focus (DOF), so that when a lithographic pattern is transferred to a wafer, the forbidden pitch should be removed from the layout. However, the sensitivity of this narrow DOF can be utilized to monitor focus changes in the scanner system itself. In this paper, a newly developed focus monitoring method utilizing the forbidden pitches is introduced and the sensitivity and advantages of this method are discussed in detail.

Paper Details

Date Published: 1 October 2011
PDF: 7 pages
J. Micro/Nanolith. 10(4) 043011 doi: 10.1117/1.3658022
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 10, Issue 4
Show Author Affiliations
Jinseok Heo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jeong-Ho Yeo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Young-Hee Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


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