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Journal of Micro/Nanolithography, MEMS, and MOEMS

Errata: Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects
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Paper Abstract

This PDF file contains the errata for “JM3 Vol. 10 Issue 04 Paper 3647513” for JM3 Vol. 10 Issue 04

Paper Details

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J. Micro/Nanolith. 10(4) 049801 doi: 10.1117/1.3647513
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 10, Issue 4, October 2011
Show Author Affiliations
Philip C. W. Ng, National Taiwan Univ. (Taiwan)
Kuen-Yu Tsai, National Taiwan Univ. (Taiwan)
Lawrence S. Melvin, Synopsys, Inc. (United States)


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