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Journal of Micro/Nanolithography, MEMS, and MOEMS

Fabrication of nanogap electrodes via nano-oxidation mask by scanning probe microscopy nanolithography
Author(s): Jalal Rouhi; Shahrom Mahmud; Sabar D. Hutagalung; Saeid Kakooei
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Paper Abstract

In this study, a simple technique was introduced for the fabrication of nanogap electrodes by using nano-oxidation scanning probe microscopy lithography with a Cr/Pt coated silicon tip. Silicon electrodes with a gap of sub-31 nm were fabricated successfully by this technique. The current-voltage measurements (I-V) of the electrodes demonstrated excellent insulating characteristics. This technique is simple, controllable, inexpensive, and faster than common methods. The results showed that silicon electrodes have a great potential for the fabrication of single molecule transistors, single electron transistors, and other nanoelectronic devices.

Paper Details

Date Published: 1 October 2011
PDF: 4 pages
J. Micro/Nanolith. MEMS MOEMS 10(4) 043002 doi: 10.1117/1.3643480
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 10, Issue 4
Show Author Affiliations
Jalal Rouhi, Univ. Sains Malaysia (Malaysia)
Shahrom Mahmud, Univ. Sains Malaysia (Malaysia)
Sabar D. Hutagalung, Univ. Sains Malaysia (Malaysia)
Saeid Kakooei, Univ. Teknologi Petronas (Malaysia)

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