Share Email Print
cover

Journal of Micro/Nanolithography, MEMS, and MOEMS

Overlay measurements by Mueller polarimetry in back focal plane
Author(s): Clément Fallet; Tatiana Novikova; Martin Foldyna; Sandeep Manhas; Bicher Haj Ibrahim; Antonello De Martino; Cyril Vannuffel; Christophe Constancias
Format Member Price Non-Member Price
PDF $20.00 $25.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Angle resolved Mueller polarimetry implemented as polarimetric imaging of a back focal plane of a high NA microscope objective has already demonstrated a good potential for CD metrology. Here we present the experimental and numerical results indicating that this technique may also be competitive for the measurements of overlay error δ. A series of samples of superimposed gratings with well controlled overlay errors have been manufactured and measured with the angle resolved Mueller polarimeter. The overlay targets were 20-μm wide. When the overlay error is δ is equal to 0, absolute values of elements of real 4×4 Mueller matrix M are invariant by matrix transposition. Otherwise this symmetry breaks down. Consequently, we define the following overlay estimator matrix as E = |M||M|<sup>t. The simulations show that matrix element E14 is the most sensitive to the overlay error. The scalar estimator of E14 was calculated by averaging the pixel values over a specifically chosen mask. This estimator is found to vary linearly with δ for overlay values up to 50 nm. Our technique allows entering small overlay marks (down to 5-μm wide). Only one target measurement is needed for each overlay direction. The actual overlay value can be determined without detailed simulation of the structure provided two calibrated overlay structures are available for each direction.

Paper Details

Date Published: 1 July 2011
PDF: 8 pages
J. Micro/Nanolith. 10(3) 033017 doi: 10.1117/1.3626852
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 10, Issue 3
Show Author Affiliations
Clément Fallet, Ecole Polytechnique (France)
Tatiana Novikova, Ecole Polytechnique (France)
Martin Foldyna, Ecole Polytechnique (France)
Sandeep Manhas, Ecole Polytechnique (France)
Bicher Haj Ibrahim, Ecole Polytechnique (France)
Antonello De Martino, Ecole Polytechnique (France)
Cyril Vannuffel, Commissariat à l'Énergie Atomique (France)
Christophe Constancias, Commissariat à l'Énergie Atomique (France)


© SPIE. Terms of Use
Back to Top