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Journal of Micro/Nanolithography, MEMS, and MOEMS

Solid-immersion Lloyd's mirror as a testbed for plasmon-enhanced ultrahigh numerical aperture lithography
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Paper Abstract

Evanescent-wave imaging is demonstrated using solid-immersion Lloyd's mirror interference lithography at λ = 325 nm to produce 44-nm half-pitch structures (numerical aperture, NA = 1.85). At such an ultrahigh NA the image depth is severely compromised due to the evanescent nature of the exposure, and the use of reflections from plasmonic underlayers is discussed as a possible solution. Simulations and modeling show that image depths in excess of 100 nm should be possible with such a system, using silver as the plasmonic material. The concept is scalable to 193 nm illumination using aluminium as the plasmonic reflector, and simulation results are shown for 26-nm half-pitch imaging into a 37-nm thick resist layer using this scheme.

Paper Details

Date Published: 1 July 2011
PDF: 11 pages
J. Micro/Nanolith. MEMS MOEMS 10(3) 033012 doi: 10.1117/1.3624516
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 10, Issue 3
Show Author Affiliations
Prateek Mehrotra, Univ. of Canterbury (New Zealand)
Charles W. Holzwarth, Univ. of Canterbury (New Zealand)
Richard J. Blaikie, Univ. of Canterbury (New Zealand)

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