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Optical Engineering

Fabrication of monomode channel waveguides in photosensitive polymer on optical adhesive
Author(s): Rahul Singhal; M. N. Satyanarayan; Suchandan Pal
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Paper Abstract

We present fabrication of optical waveguides in a photosensitive polymer. The process to fabricate monomode polymeric channel waveguides using simple direct ultraviolet (UV) photolithography is optimized. Channel waveguides of width ~2 to 2.4 µm and height ~1.8 to 2.2 µm are obtained on development after a crosslinkable negative tone epoxy SU-8 2002 polymer is exposed to UV through a photomask. Norland Optical Adhesive 61 (NOA 61) was used as under- and overclad. The average insertion loss obtained at chip-level is ~11 dB (TE00) and ~12 dB (TM00) for 2-cm waveguide at 1550 nm.

Paper Details

Date Published: 1 September 2011
PDF: 4 pages
Opt. Eng. 50(9) 094601 doi: 10.1117/1.3622758
Published in: Optical Engineering Volume 50, Issue 9
Show Author Affiliations
Rahul Singhal, Birla Institute of Technology and Science (India)
M. N. Satyanarayan, National Institute of Technology, Karnataka (India)
Suchandan Pal, Central Electronics Engineering Research Institute (India)


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