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Journal of Micro/Nanolithography, MEMS, and MOEMS

Fast algorithm for quadratic aberration model in optical lithography based on cross triple correlation
Author(s): Shiyuan Liu; Wei Liu; Tingting Zhou
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Paper Abstract

The quadratic aberration model used in optical lithography is a natural extension of the linear model by taking into account interactions among individual Zernike coefficients. Although the model has been tested and verified in many applications, the effects of Zernike coefficients under partially coherent imaging are usually obtained by extensive experiments due to the complexity of the model expression. In this paper, a generalized cross triple correlation (CTC) is introduced and a fast algorithm to simulate the quadratic aberration model is developed. Simulations were performed by the proposed CTC-based algorithm with different input Zernike aberrations for binary and phase shift masks with multiple pitches and orientations, which demonstrate that the proposed approach is not only accurate but also efficient for revealing the influence of different Zernike orders on aerial image intensity distributions under partially coherent illumination.

Paper Details

Date Published: 1 April 2011
PDF: 9 pages
J. Micro/Nanolith. MEMS MOEMS 10(2) 023007 doi: 10.1117/1.3586797
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 10, Issue 2
Show Author Affiliations
Shiyuan Liu, Huazhong Univ. of Science and Technology (China)
Wei Liu, Huazhong Univ. of Science and Technology (China)
Tingting Zhou, Huazhong Univ. of Science and Technology (China)

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