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Journal of Micro/Nanolithography, MEMS, and MOEMS

Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
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J. Micro/Nanolith. 10(2) 029801 doi: 10.1117/1.3576188
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 10, Issue 2, April 2011
Show Author Affiliations
Philip C. W. Ng, National Taiwan Univ. (Taiwan)
Kuen-Yu Tsai, National Taiwan Univ. (Taiwan)
Yen-Min Lee, National Taiwan Univ. (Taiwan)
Fu-Min Wang, National Taiwan Univ. (Taiwan)
Jia-Han Li, National Taiwan Univ. (Taiwan)
Alek C. Chen, ASML San Jose (United States)


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