Share Email Print
cover

Journal of Micro/Nanolithography, MEMS, and MOEMS

Measurement of critical dimension in scanning electron microscope mask images
Author(s): Wonsuk Lee; Sang Hyun Han; Hong Jeong
Format Member Price Non-Member Price
PDF $20.00 $25.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In semiconductor industries, controlling and measuring critical dimensions are two important tools to design masks. However, measuring the dimensions with physical tools becomes more challenging, and the traditional method of measuring is slow and has many processes though it is accurate. This paper suggests a method that accurately measures the critical dimension length in a short time based on the digital image processing.

Paper Details

Date Published: 1 April 2011
PDF: 8 pages
J. Micro/Nanolith. 10(2) 023003 doi: 10.1117/1.3574771
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 10, Issue 2
Show Author Affiliations
Wonsuk Lee, Pohang Univ. of Science and Technology (Korea, Republic of)
Sang Hyun Han, Pohang Univ. of Science and Technology (Korea, Republic of)
Hong Jeong, Pohang Univ. of Science and Technology (Korea, Republic of)


© SPIE. Terms of Use
Back to Top