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Journal of Micro/Nanolithography, MEMS, and MOEMS

Monolithically integrated low-loss three-dimensional spot-size converter and silicon photonic waveguides constructed by nanotuned Bosch process and oxidation
Author(s): Ling-Han Li; Akio Higo; Masakazu Sugiyama; Yoshiaki Nakano
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Paper Abstract

This paper presents a three-dimensional (3D) tapered spot-size converter connecting to silicon wire waveguide and silicon rib waveguide. The silicon 3D structure was essentially formed by a single-step deep anisotropic dry etching of arrayed submicron-scale line patterns with different pitches, resulting in a tailored depth profile which is controlled by the line pattern through loading effect. Subsequent thermal oxidation and removal of the oxidized portion with wet etching led to a bare 3D silicon structure with smooth surface. The optical mode from a 4.6 μm × 3.1 μm silicon rib waveguide was successfully coupled to a 280 nm × 500 nm nanowire waveguide by a silicon 3D tapered spot-size converter, with average coupling loss of 1.52 dB.

Paper Details

Date Published: 1 April 2011
PDF: 8 pages
J. Micro/Nanolith. MEMS MOEMS 10(2) 023002 doi: 10.1117/1.3574143
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 10, Issue 2
Show Author Affiliations
Ling-Han Li, The Univ. of Tokyo (Japan)
Akio Higo, The Univ. of Tokyo (Japan)
Masakazu Sugiyama, The Univ. of Tokyo (Japan)
Yoshiaki Nakano, The Univ. of Tokyo (Japan)

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