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Journal of Micro/Nanolithography, MEMS, and MOEMS

New approaches of mold fabrication for nanoimprint lithography
Author(s): Chien-Hung Lin; Rongshun Chen
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Paper Abstract

We present the new mold fabrications for nanoimprint lithography for the application of ordered array of rod or pore patterning. The concave and convex types of the mold are achieved. For this technology, the master is required preparation before the mold fabrication. The master is utilized by step and repeated to achieve the structures over a large area on the mold. The master, mold, and imprint results demonstrate that the new approaches of mold fabrication could be a feasible scheme with low cost and high throughput.

Paper Details

Date Published: 1 January 2011
PDF: 6 pages
J. Micro/Nanolith. MEMS MOEMS 10(1) 011506 doi: 10.1117/1.3564881
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 10, Issue 1
Show Author Affiliations
Chien-Hung Lin, Chinese Culture Univ. (Taiwan)
Rongshun Chen, Chinese Culture Univ. (Taiwan)

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