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Journal of Nanophotonics

Cathodoluminescence and photoluminescence comparative study of erbium-doped silicon-rich silicon oxide
Author(s): Sébastien Cueff; Christophe Labbé; Benjamin Dierre; Julien Cardin; Larysa Khomenkova; Filippo Fabbri; Takashi Sekiguchi; Richard Rizk
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Paper Abstract

We present a study on erbium (Er)-doped silicon (Si)-rich silicon oxide thin films grown by the magnetron cosputtering of three confocal cathodes according to the deposition temperature and the annealing treatment. It is shown that, through a careful tuning of both deposition and annealing temperatures, it is possible to engineer the fraction of agglomerated Si that may play the role of sensitizer toward Er ions. To investigate the different emitting centers present within the films according to the fraction of agglomerated Si, a cathodoluminescence experiment was made. We observe in all samples contributions from point-defect centers due to some oxygen vacancies and generally known as silicon-oxygen deficient centers (SiODC), at around 450-500 nm. The behavior of such contributions suggests the possible occurrence of an energy transfer from the SiODCs toward Er3+ ions. Photoluminescence experiments were carried out to characterize the energy transfer from Si nanoclusters toward Er3+ ions with a nonresonant wavelength (476 nm) that is unable to excite SiODCs and then exclude any role of these centers in the energy transfer process for the PL experiments. Accordingly, it is shown that structural differences have some effects on the optical properties that lead to better performance for high-temperature deposited material. This aspect is illustrated by the Er-PL efficiency that is found higher for 500°C-deposited, when compared to that for RT-deposited sample. Finally, it is shown that the Er-PL efficiency is gradually increasing as a function of the fraction of agglomerated silicon.

Paper Details

Date Published: 1 January 2011
PDF: 17 pages
J. Nanophoton. 5(1) 051504 doi: 10.1117/1.3549701
Published in: Journal of Nanophotonics Volume 5, Issue 1
Show Author Affiliations
Sébastien Cueff, Ecole Nationale Supérieure d'Ingenieurs de Caen et Ctr. de Recherche (France)
Christophe Labbé, Ecole Nationale Supérieure d'Ingenieurs de Caen et Ctr. de Recherche (France)
Benjamin Dierre, National Institute for Materials Science (Japan)
Julien Cardin, Ecole Nationale Supérieure d'Ingenieurs de Caen et Ctr. de Recherche (France)
Larysa Khomenkova, Ecole Nationale Supérieure d'Ingenieurs de Caen et Ctr. de Recherche (France)
Filippo Fabbri, National Institute for Materials Science (Japan)
Takashi Sekiguchi, National Institute for Materials Science (Japan)
Richard Rizk, Ecole Nationale Supérieure d'Ingenieurs de Caen et Ctr. de Recherche (France)


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