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Optical Engineering

On-the-fly writing of a long grating phase mask
Author(s): Philipp Muller; Yves Jourlin; Colette Veillas; Gerard Bernaud; Yannick Bourgin; Svetlen H. Tonchev; Olivier Dellea
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Paper Abstract

A method is demonstrated for writing long grating phase masks, which can be used for patterning large-area (square meter size) submicron-period gratings. The method consist of illuminating a small area transmission grating phase mask by a continous wave transverse-electric-polarized collimated laser beam under the −1st order Littrow mounting to define a high-contrast interferogram composed of fringes. By sliding a long photoresist-coated substrate under this small area phase mask, gratings of arbitrary length may be written, with grating lines oriented in the scan direction. The patterning of uninterrupted gratings with lengths exceeding 300 mm is demonstrated.

Paper Details

Date Published: 1 March 2011
PDF: 10 pages
Opt. Eng. 50(3) 038001 doi: 10.1117/1.3549254
Published in: Optical Engineering Volume 50, Issue 3
Show Author Affiliations
Philipp Muller, Univ. Jean Monnet Saint-Etienne (France)
Yves Jourlin, Univ. Jean Monnet Saint-Etienne (France)
Colette Veillas, Univ. Jean Monnet Saint-Etienne (France)
Gerard Bernaud, Univ. Jean Monnet Saint-Etienne (France)
Yannick Bourgin, Univ. Jean Monnet Saint-Etienne (France)
Svetlen H. Tonchev, Univ. Jean Monnet Saint-Etienne (France)
Olivier Dellea, Commissariat à l'Énergie Atomique (France)


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