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Journal of Nanophotonics

Low-reflectivity wire-grid polarizers multilayered by the glancing-angle-deposition technique
Author(s): Motofumi Suzuki; Akio Takada; Takatoshi Yamada; Takashi Hayasaka; Kouji Sasaki; Eiji Takahashi; Seiji Kumagai
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Paper Abstract

We have examined antireflection (AR) coatings for high reflectivity metals such as Al on the basis of the admittance diagram. The proposed AR coatings consist of bilayers of absorptive and dielectric materials. A wide variety of materials can be used for AR coatings by tuning the thicknesses of both the absorptive and the dielectric layers. The bilayered AR concept has been applied to reduce the reflectance of wire grid (WG) polarizers made of Al. An absorptive FeSi 2 layer has been deposited by the glancing angle deposition technique immediately on the top of Al wires covered with a thin SiO 2 layer. For the optimum combination of the thicknesses of FeSi 2 and SiO 2, the reflectance reduces to lower than a few percent independent of the polarization, whereas the transmission polarization properties remain favorable. We have demonstrated that Ge is also appropriate for the low-reflectivity WG polarizers as an absorptive material. Because low-reflectivity WG polarizers are completely composed of inorganic materials, they are useful for applications requiring thermal durability, such as liquid crystal projection displays.

Paper Details

Date Published: 1 January 2011
PDF: 10 pages
J. Nanophoton. 5(1) 051501 doi: 10.1117/1.3543821
Published in: Journal of Nanophotonics Volume 5, Issue 1
Show Author Affiliations
Motofumi Suzuki, Kyoto Univ. (Japan)
Akio Takada, Sony Chemical & Information Device Corp. (Japan)
Takatoshi Yamada, Sony Chemical & Information Device Corp. (Japan)
Takashi Hayasaka, Sony Chemical & Information Device Corp. (Japan)
Kouji Sasaki, Sony Chemical & Information Device Corp. (Japan)
Eiji Takahashi, Sony Chemical & Information Device Corp. (Japan)
Seiji Kumagai, Sony Chemical & Information Device Corp. (Japan)

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