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Journal of Micro/Nanolithography, MEMS, and MOEMS

Fabrication of submicron metallic grids with interference and phase-mask holography
Author(s): Joong-Mok Park; Tae Geun Kim; Kristen P. Constant; Kai-Ming Ho
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Paper Abstract

Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6%) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.

Paper Details

Date Published: 1 January 2011
PDF: 5 pages
J. Micro/Nanolith. MEMS MOEMS 10(1) 013011 doi: 10.1117/1.3541794
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 10, Issue 1
Show Author Affiliations
Joong-Mok Park, Iowa State Univ. (United States)
Tae Geun Kim, Korea Univ. (Korea, Republic of)
Kristen P. Constant, Iowa State Univ. (United States)
Kai-Ming Ho, Iowa State Univ. (United States)

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