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Journal of Micro/Nanolithography, MEMS, and MOEMS

Study of electrification of extreme ultraviolet lithography mask and adhesion of particles during electrostatic chucking
Author(s): Mitsuaki Amemiya; Kazuya Ota; Takao Taguchi; Osamu Suga
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Paper Abstract

One of the critical issues for extreme ultraviolet lithography masks is particle-free mask handling. We report that the number of particle adders on the front side of a mask in a dual pod can be reduced to less than 0.01 particles/cycle (>46-nm polystyrene latex) during the process of starting from the load port to placing an electrostatic chuck (ESC) in vacuum. In addition, we find that chucking the mask on the ESC causes serious issues. One of these issues is whether the masks will be electrically charged by chucking the ESC and whether some particles will be added on the front side. We measure the electric potential of the back and front sides of the mask and examine the particle adders. We find that when the mask is electrically floated, potential on the front side of the mask increases during ESC chucking; when the mask is released from the ESC, it is electrically charged. This electrification causes adhesion of the particles. Our experiments show that to protect the mask from particles, the mask must be grounded throughout the entire process. For electrification, we confirm that a dual-pod system is effective in protecting the mask from particles.

Paper Details

Date Published: 1 January 2011
PDF: 9 pages
J. Micro/Nanolith. 10(1) 013002 doi: 10.1117/1.3532835
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 10, Issue 1
Show Author Affiliations
Mitsuaki Amemiya, Canon, Inc. (Japan)
Kazuya Ota, Semiconductor Leading Edge Technologies, Inc. (Japan)
Takao Taguchi, Semiconductor Leading Edge Technologies, Inc. (Japan)
Osamu Suga, Semiconductor Leading Edge Technologies, Inc. (Japan)


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