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Journal of Micro/Nanolithography, MEMS, and MOEMS

Mesoscale simulation of line-edge structures based on polymer chains in development and rinse processes
Author(s): Hiroshi Morita; Masao Doi
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Paper Abstract

To study line-edge roughness (LER), we develop a simulation method for the formation process of line edges based on the mesoscale simulation of the dissipative particle dynamics (DPD) method. We model the development and rinse processes based on the coarse-grained resist polymer model. It is important that the block copolymer in which the soluble and insoluble blocks are bonded exists at the line edge. Though the soluble part of this block copolymer is stretched out in the development process, it shrinks in the rinse process. The shrunken polymers contribute to the formation of line edges, and LER is very influenced by these polymers. Our simulations help to analyze the formation process of line edges based on resist polymer chain dynamics.

Paper Details

Date Published: 1 October 2010
PDF: 7 pages
J. Micro/Nanolith. 9(4) 041213 doi: 10.1117/1.3530593
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 9, Issue 4
Show Author Affiliations
Hiroshi Morita, National Institute of Advanced Industrial Science and Technology (Japan)
Masao Doi, The Univ. of Tokyo (Japan)

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