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Journal of Micro/Nanolithography, MEMS, and MOEMS

Characterization of dry etching of TiO2/SiO2 distributed Bragg reflectors for tunable optical sensor arrays
Author(s): Onny Setyawati; Markus Engenhorst; Martin Bartels; Vadim Daneker; Stefan Wittzack; Tatjana Woit; Florestan Köhler; Harmut H. Hillmer
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Paper Abstract

We present the characterization of a dry-etching process for high-contrast TiO2/SiO2 distributed Bragg reflectors, by inductively coupled plasma reactive ion etching, focusing on the etch rate and the etch selectivity. Photoresists and metals as etch masks were investigated. An excellent etch profile using an indium tin oxide mask was obtained, with an etch rate of >80 nm/min at a pressure of 6 mTorr. The experiments were developed for structuring Fabry-Pérot filters for tunable optical sensor arrays.

Paper Details

Date Published: 1 October 2010
PDF: 6 pages
J. Micro/Nanolith. 9(4) 041110 doi: 10.1117/1.3524828
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 9, Issue 4
Show Author Affiliations
Onny Setyawati, Univ. Kassel (Germany)
Markus Engenhorst, Univ. Kassel (Germany)
Martin Bartels, Univ. Kassel (Germany)
Vadim Daneker, Univ. Kassel (Germany)
Stefan Wittzack, Univ. Kassel (Germany)
Tatjana Woit, Univ. Kassel (Germany)
Florestan Köhler, Univ. Kassel (Germany)
Harmut H. Hillmer, Univ. Kassel (Germany)


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