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Journal of Nanophotonics • Open Access

Commentary: Nano- and micromachining using laser plasma soft X-rays
Author(s): Tetsuya Makimura; Shuichi Torii; Hiroyuki Niino; Kouichi Murakami

Paper Abstract

Investigating interactions of intense soft X-rays with solid surfaces and resulting phenomena is still challenging. One could expect material removal from the surfaces (ablation) caused by soft X-ray irradiation at a precision as high as the diffraction limit of the soft X-rays. The X-ray ablation technique could enable us to fabricate nano- and micro-structures on surfaces of even transparent materials such as silica glass, polymethylmethacrylate (PMMA) and polydimethylsiloxane (PDMS), which are highly valued for their use in the fields of nanometric chemical analysis and chemical reactions in medicine and biotechnology.

Paper Details

Date Published: 1 August 2010
PDF: 5 pages
J. Nanophoton. 4(1) 040305 doi: 10.1117/1.3488615
Published in: Journal of Nanophotonics Volume 4, Issue 1
Show Author Affiliations
Tetsuya Makimura, Univ. of Tsukuba (Japan)
Shuichi Torii, Univ. of Tsukuba (Japan)
Hiroyuki Niino, National Institute of Advanced Industrial Science and Technology (Japan)
Kouichi Murakami, Univ. of Tsukuba (Japan)


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