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Journal of Micro/Nanolithography, MEMS, and MOEMS

Plant-based resist materials for ultraviolet curing nanoimprint lithography
Author(s): Satoshi Takei
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Paper Abstract

Plant-based resist materials with liquid trehalose derivatives are investigated to achieve low volumetric shrinkage in ultraviolet curing nanoimprint lithography. This procedure is proven to be suitable for resist material design in the process conditions of ultraviolet curing nanoimprint lithography. The developed plant-based resist material using liquid trehalose derivatives with epoxy groups produces high-quality imprint images of 65-nm line and space. The distinctive bulky glucose structure in trehalose derivatives is considered to be effective for minimizing volumetric shrinkage of resist film during ultraviolet polymerization.

Paper Details

Date Published: 1 July 2010
PDF: 4 pages
J. Micro/Nanolith. MEMS MOEMS 9(3) 033006 doi: 10.1117/1.3475951
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 9, Issue 3
Show Author Affiliations
Satoshi Takei, Toyama Prefectural Univ. (Japan)


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