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Journal of Micro/Nanolithography, MEMS, and MOEMS

Focused ion beam-based nanoimprint stamp for replicating micro/nanostructures under low temperature
Author(s): Hongwen Sun; Guogao Liu; Shanming Lin; Jingquan Liu; Di Chen
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Paper Abstract

Focused ion beam (FIB) was employed to fabricate nanoimprint lithography stamps. Complex micro/nanopatterns were fabricated in the stamp, including curved nanograting structures. These micro/nanostructures were then replicated to SU-8 2000.1 resist, with an imprint temperature of 95 °C, which is lower than for conventional imprint polymers. Atomic force microscopy was used to characterize the surface profiles of stamp and replica's and the replication fidelity as well. The results show that nanoimprint with the FIB fabricated stamp can successfully replicate complex micro/nanostructures under low temperature in SU-8.

Paper Details

Date Published: 1 July 2010
PDF: 4 pages
J. Micro/Nanolith. MEMS MOEMS 9(3) 033005 doi: 10.1117/1.3469818
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 9, Issue 3
Show Author Affiliations
Hongwen Sun, Hohai Univ. (China)
Guogao Liu, Hohai Univ. (China)
Shanming Lin, Hohai Univ. (China)
Jingquan Liu, Shanghai Jiao Tong Univ. (China)
Di Chen, Shanghai Jiao Tong Univ. (China)

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