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Journal of Micro/Nanolithography, MEMS, and MOEMS

Nebulous hotspot and algorithm variability in computation lithography
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Paper Abstract

Computation lithography relies on algorithms. However, these algorithms exhibit variability that can be as much as 5% (one standard deviation) of the critical dimension for the 65-nm technology. Using hotspot analysis and fixing as an example, we argue that such variability can be addressed on the algorithm level via controlling and eliminating its root causes, and on the application level by setting specifications that are commensurate with both the limitations of the algorithms and the goals of the application.

Paper Details

Date Published: 1 July 2010
PDF: 9 pages
J. Micro/Nanolith. MEMS MOEMS 9(3) 033002 doi: 10.1117/1.3459937
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 9, Issue 3
Show Author Affiliations
Edmund Y. Lam, The Univ. of Hong Kong (Hong Kong, China)


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