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Journal of Micro/Nanolithography, MEMS, and MOEMS

Single-exposure maskless plasmonic lithography for patterning of periodic nanoscale grating features
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Paper Abstract

A lithography technique for patterning one-dimensional (1-D) nanoscale grating features based on surface plasmon (SP) interference is demonstrated both experimentally and numerically. We report a cost-effective, single-exposure maskless plasmonic lithography to generate 156-nm periodic grating lines at an exposure wavelength of 364 nm.

Paper Details

Date Published: 1 April 2010
PDF: 4 pages
J. Micro/Nanolith. MEMS MOEMS 9(2) 023007 doi: 10.1117/1.3386680
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 9, Issue 2
Show Author Affiliations
K. V. Sreekanth, Nanyang Technological Univ. (Singapore)
Vadakke Matham Murukeshan, Nanyang Technological Univ. (Singapore)

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