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Journal of Micro/Nanolithography, MEMS, and MOEMS

Micropore and nanopore fabrication in hollow antiresonant reflecting optical waveguides
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Paper Abstract

We demonstrate the fabrication of micropore and nanopore features in hollow antiresonant reflecting optical waveguides to create an electrical and optical analysis platform that can size select and detect a single nanoparticle. Micropores (4 µm diameter) are reactive-ion etched through the top SiO2 and SiN layers of the waveguides, leaving a thin SiN membrane above the hollow core. Nanopores are formed in the SiN membranes using a focused ion-beam etch process that provides control over the pore size. Openings as small as 20 nm in diameter are created. Optical loss measurements indicate that micropores did not significantly alter the loss along the waveguide.

Paper Details

Date Published: 1 April 2010
PDF: 6 pages
J. Micro/Nanolith. 9(2) 023004 doi: 10.1117/1.3378152
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 9, Issue 2
Show Author Affiliations
Matthew R. Holmes, Brigham Young Univ. (United States)
Tao Shang, Brigham Young Univ. (United States)
Aaron R. Hawkins, Brigham Young Univ. (United States)
Mikhail I. Rudenko, Univ. of California, Santa Cruz (United States)
Philip Measor, Univ. of California, Santa Cruz (United States)
Holger Schmidt, Univ. of California, Santa Cruz (United States)


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