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Journal of Nanophotonics • Open Access

Effects of hydrogen pretreatment on physical-vapor-deposited nickel catalyst for multi-walled carbon nanotube growth
Author(s): Benjamin L. Crossley; Mauricio Kossler; Ronald Arman Coutu; LaVern A. Starman; Peter J. Collins

Paper Abstract

Physical vapor deposited nickel catalyst layers of 10, 50, 100, 200, 350, and 500 angstroms were granulated using hydrogen plasma for varying times to determine an effective carbon nanotube (CNT) growth process using microwave plasma enhanced CVD (MPECVD). Nickel was deposited via sputtering or evaporation. The catalyst granule size, density, and resulting CNTs were analyzed. Sputtered nickel of 50 angstroms with 5 minutes of hydrogen plasma pretreatment resulted in the most effective CNT growth.

Paper Details

Date Published: 1 February 2010
PDF: 6 pages
J. Nanophoton. 4(1) 049502 doi: 10.1117/1.3356218
Published in: Journal of Nanophotonics Volume 4, Issue 1
Show Author Affiliations
Benjamin L. Crossley, Air Force Institute of Technology (United States)
Mauricio Kossler, Air Force Institute of Technology (United States)
Ronald Arman Coutu, Air Force Institute of Technology (United States)
LaVern A. Starman, Air Force Institute of Technology (United States)
Peter J. Collins, Air Force Institute of Technology (United States)


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