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Journal of Micro/Nanolithography, MEMS, and MOEMS

Extreme ultraviolet lithography's path to manufacturing
Author(s): Harry J. Levinson
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Paper Abstract

The origins of extreme ultraviolet (EUV) lithography and its progress toward readiness for manufacturing are recounted. Source power and reliability and mask defects are known items requiring additional improvement before EUV lithography will be suitable for use in the volume manufacturing of integrated circuits. Additional cycles of learning, as obtained from pilot line operation, will greatly accelerate the maturation of EUV lithography and enable its use in manufacturing as early as 2013.

Paper Details

Date Published: 1 October 2009
PDF: 9 pages
J. Micro/Nanolith. MEMS MOEMS 8(4) 041501 doi: 10.1117/1.3273965
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 8, Issue 4
Show Author Affiliations
Harry J. Levinson, GLOBALFOUNDRIES Inc. (United States)


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