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Journal of Micro/Nanolithography, MEMS, and MOEMS

Fabrication of silicon microring resonator with smooth sidewalls
Author(s): Yao Chen; Junbo Feng; Zhiping Zhou; Jun Yu; Christopher J. Summers; David S. Citrin
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Paper Abstract

Fabrication of silicon microring resonators was optimized by using electron-beam lithography (EBL) and inductively coupled plasma (ICP) etching with different mask materials. Sidewall roughness of less than 10 nm was revealed by high-resolution scanning electron microscopy (SEM) without any post-etch process. The fabrication processes are described in detail, and comparisons are made in consideration of process complexity, process latitude, and sidewall roughness.

Paper Details

Date Published: 1 October 2009
PDF: 5 pages
J. Micro/Nanolith. 8(4) 043060 doi: 10.1117/1.3258487
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 8, Issue 4
Show Author Affiliations
Yao Chen, Guangxi Univ. (China)
Junbo Feng, Peking Univ. (China)
Zhiping Zhou, Peking Univ. (China)
Jun Yu, Huazhong Univ. of Science and Technology (China)
Christopher J. Summers, Georgia Institute of Technology (United States)
David S. Citrin, Georgia Institute of Technology (United States)

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