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Journal of Micro/Nanolithography, MEMS, and MOEMS

Residual speckle in a lithographic illumination system
Author(s): Gregg M. Gallatin; Naonori Kita; Tomoko Ujike; William N. Partlo
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Paper Abstract

Finite bandwidth and finite exposure time place a fundamental limit on dose uniformity. We evaluate the amplitude and spatial distribution of this residual speckle in a given type of lithographic illumination system. For nominal bandwidths and exposure times, the level of dose nonuniformity is on the order of several percent. We argue that this effect actually makes only a small contribution to line edge roughness.

Paper Details

Date Published: 1 October 2009
PDF: 11 pages
J. Micro/Nanolith. MEMS MOEMS 8(4) 043003 doi: 10.1117/1.3256007
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 8, Issue 4
Show Author Affiliations
Gregg M. Gallatin, National Institute of Standards and Technology (United States)
Naonori Kita, Nikon Corp. (Japan)
Tomoko Ujike, Nikon Corp. (Japan)
William N. Partlo, Cymer, Inc. (United States)

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