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Journal of Micro/Nanolithography, MEMS, and MOEMS

Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography
Author(s): Cheng-Chung Jaing; Chii-Rong Yang; Chun-Ming Chang; Chao-Te Lee; Chien-Nan Hsiao
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Paper Abstract

Ni films, replacing photoresists, serve as masks in the selective deposition of optical thin films by electron-beam gun evaporation at a substrate temperature of 300°C. Photolithography is adopted herein to define the growth of Ni films by electroforming. Mosaic patterns with a width of 20 µm are employed as red color filters, which are longwave pass. These red filters are formed from alternate SiO2 and TiO2 layers and have a mean transmittance of >90%. The experimental results show that the combined use of photolithography, electroforming, and electron-beam gun evaporation can deposit miniaturized multilayer dielectric coatings with high light transmittance in a hot process.

Paper Details

Date Published: 1 July 2009
PDF: 5 pages
J. Micro/Nanolith. 8(3) 033009 doi: 10.1117/1.3222910
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 8, Issue 3
Show Author Affiliations
Cheng-Chung Jaing, Ming Hsin Univ. of Science and Technology (Taiwan)
Chii-Rong Yang, National Taiwan Normal Univ. (Taiwan)
Chun-Ming Chang, National Taiwan Normal Univ. (Taiwan)
Chao-Te Lee, Instrument Technology Research Ctr. (Taiwan)
Chien-Nan Hsiao, Instrument Technology Research Ctr. (Taiwan)


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