Share Email Print

Journal of Micro/Nanolithography, MEMS, and MOEMS

Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography
Author(s): Cheng-Chung Jaing; Chii-Rong Yang; Chun-Ming Chang; Chao-Te Lee; Chien-Nan Hsiao
Format Member Price Non-Member Price
PDF $20.00 $25.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Ni films, replacing photoresists, serve as masks in the selective deposition of optical thin films by electron-beam gun evaporation at a substrate temperature of 300°C. Photolithography is adopted herein to define the growth of Ni films by electroforming. Mosaic patterns with a width of 20 µm are employed as red color filters, which are longwave pass. These red filters are formed from alternate SiO2 and TiO2 layers and have a mean transmittance of >90%. The experimental results show that the combined use of photolithography, electroforming, and electron-beam gun evaporation can deposit miniaturized multilayer dielectric coatings with high light transmittance in a hot process.

Paper Details

Date Published: 1 July 2009
PDF: 5 pages
J. Micro/Nanolith. 8(3) 033009 doi: 10.1117/1.3222910
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 8, Issue 3
Show Author Affiliations
Cheng-Chung Jaing, Ming Hsin Univ. of Science and Technology (Taiwan)
Chii-Rong Yang, National Taiwan Normal Univ. (Taiwan)
Chun-Ming Chang, National Taiwan Normal Univ. (Taiwan)
Chao-Te Lee, Instrument Technology Research Ctr. (Taiwan)
Chien-Nan Hsiao, Instrument Technology Research Ctr. (Taiwan)

© SPIE. Terms of Use
Back to Top