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Optical Engineering • Open Access

Feature size reduction of silicon slot waveguides by partial filling using atomic layer deposition
Author(s): Tapani Alasaarela; Antti Säynätjoki; Teppo Hakkarainen; Seppo K. Honkanen

Paper Abstract

We propose a novel method to realize silicon-on-insulator (SOI)-based air slot waveguides for sensing applications. The method, based on feature size reduction using conformal thin films grown by atomic layer deposition (ALD), enables a guided slot mode in a silicon slot waveguide with a patterned slot width of more than 200 nm. Feature size reduction of slot structures with ALD grown amorphous TiO2 is demonstrated.

Paper Details

Date Published: 1 August 2009
PDF: 3 pages
Opt. Eng. 48(8) 080502 doi: 10.1117/1.3206731
Published in: Optical Engineering Volume 48, Issue 8
Show Author Affiliations
Tapani Alasaarela, Helsinki Univ. of Technology (Finland)
Antti Säynätjoki, Helsinki Univ. of Technology (Finland)
Teppo Hakkarainen, Helsinki Univ. of Technology (Finland)
Seppo K. Honkanen, Helsinki Univ. of Technology (Finland)

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