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Journal of Micro/Nanolithography, MEMS, and MOEMS

Orientation Zernike polynomials: a useful way to describe the polarization effects of optical imaging systems
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Paper Abstract

We introduce the new concept of orientation Zernike polynomials, a base function representation of retardation and diattenuation in close analogy to the wavefront description by scalar Zernike polynomials. We show that the orientation Zernike polynomials provide a complete and systematic description of vector imaging using high numerical aperture lithography lenses and, hence, a basis for an in depth understanding of both polarized and unpolarized imaging, and its modeling.

Paper Details

Date Published: 1 July 2009
PDF: 22 pages
J. Micro/Nanolith. 8(3) 031404 doi: 10.1117/1.3173803
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 8, Issue 3
Show Author Affiliations
Johannes Ruoff, Carl Zeiss SMT AG (Germany)
Michael Totzeck, Carl Zeiss SMT AG (Germany)


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