Journal of Micro/Nanolithography, MEMS, and MOEMSOrientation Zernike polynomials: a useful way to describe the polarization effects of optical imaging systems
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We introduce the new concept of orientation Zernike polynomials, a base function representation of retardation and diattenuation in close analogy to the wavefront description by scalar Zernike polynomials. We show that the orientation Zernike polynomials provide a complete and systematic description of vector imaging using high numerical aperture lithography lenses and, hence, a basis for an in depth understanding of both polarized and unpolarized imaging, and its modeling.