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Journal of Micro/Nanolithography, MEMS, and MOEMS

Stochastic modeling in lithography: use of dynamical scaling in photoresist development
Author(s): Chris A. Mack
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Paper Abstract

The concepts of dynamical scaling in the study of kinetic roughness are applied to the problem of photoresist development. Uniform, open-frame exposure and development of photoresist corresponds to the problem of quenched noise and the etching of random disordered media and is expected to fall in the Kadar-Parisi-Zhang (KPZ) universality class. To verify this expectation, simulations of photoresist development in 1+1 dimensions were carried out with random, uncorrelated noise added to an otherwise uniform development rate. The resulting roughness exponent α and the growth exponent β were found to match the 1+1 KPZ values exactly.

Paper Details

Date Published: 1 July 2009
PDF: 8 pages
J. Micro/Nanolith. MEMS MOEMS 8(3) 033001 doi: 10.1117/1.3158612
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 8, Issue 3
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