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Journal of Micro/Nanolithography, MEMS, and MOEMS

Stochastic modeling in lithography: autocorrelation behavior of catalytic reaction-diffusion systems
Author(s): Chris A. Mack
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Paper Abstract

Reaction-diffusion chemical systems where the catalyst of the reaction is the only diffusing species are investigated. Here, the correlation length and Hurst roughness exponent are derived in one-, two-, and three-dimensional first-order catalytic reaction-diffusion problems. These results are relevant to many chemical systems, and in particular to chemically amplified photoresists used in semiconductor lithography, where the correlation length and Hurst exponent affect the line-edge roughness of sub-100-nm printed features.

Paper Details

PDF: 3 pages
J. Micro/Nanolith. 8(2) 029701 doi: 10.1117/1.3155516
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 8, Issue 2, April 2009
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