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Journal of Micro/Nanolithography, MEMS, and MOEMS

Fabrication of novel silicon dual atomic force microscope tip with narrow gap
Author(s): Shinji Morita; Takashi Mineta; Eiji Makino; Akihiro Umino; Takahiro Kawashima; Takayuki Shibata
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Paper Abstract

We propose a novel fabrication process for twin probes of an atomic force microscope (AFM) that consist of a silicon dual tip with a narrow gap. The dual tip with a tetrahedral shape consists of an inclined silicon (111) plane and two vertical planes and was successfully fabricated by using the proposed fabrication process of combining deep reactive ion etching (D-RIE) for silicon trench formation along the silicon (001) direction, selective oxidation of the sidewalls of the trench, and crystalline anisotropic etching. The silicon tips could be sharpened by a low-temperature oxidation process, resulting in a tip radius of about 10 nm. In addition, the dual silicon tip formation, dual AFM probe with cantilever, and thermal actuator were also successfully fabricated from a silicon-on-insulator (SOI) water. The gap of the dual tip was about 2.9 µm, with trench etching 1 µm wide and sidewall oxidation 1 µm thick.

Paper Details

Date Published: 1 April 2009
PDF: 5 pages
J. Micro/Nanolith. 8(2) 021117 doi: 10.1117/1.3142970
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 8, Issue 2
Show Author Affiliations
Shinji Morita, Hirosaki Univ. (Japan)
Takashi Mineta, Hirosaki Univ. (Japan)
Eiji Makino, Hirosaki Univ. (Japan)
Akihiro Umino, Hirosaki Univ. (Japan)
Takahiro Kawashima, Toyohashi Univ. of Technology (Japan)
Takayuki Shibata, Toyohashi Univ. of Technology (Japan)


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