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Journal of Micro/Nanolithography, MEMS, and MOEMS

Novel imprint lithography process used in fabrication of micro/nanostructures in organic photovoltaic devices
Author(s): Hongzhong Liu; Yucheng Ding; Weitao Jiang; Qin Lian; Lei Yin; Yongsheng Shi; Bingheng Lu
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Paper Abstract

A novel multistep loading and demolding process in nanoimprint lithography (NIL) with a soft mold is developed to fabricate 3-D micro- or nanoscale cathode structures in polymer photovoltaic (PPV) devices. Experiments show that this new NIL process, called distortion reduction by pressure releasing (DRPR) and two-step curing method for the demolding process, can reduce and avoid the distortions of the imprint mold and wafer stage, and through the two-step curing method, the transformation of resist from liquid to solid state can be controlled, which is helpful to decrease the demolding force and avoid some defects caused by "blind" demolding. With this new NIL process, the main replicating error caused by distortions and blind demolding can be limited effectively, and the micro- or nanoscale cathode structures in PPV devices can be fabricated with high fidelity to the imprint mold, which can improve the power conversion efficiency of PPV.

Paper Details

Date Published: 1 April 2009
PDF: 3 pages
J. Micro/Nanolith. 8(2) 021170 doi: 10.1117/1.3142966
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 8, Issue 2
Show Author Affiliations
Hongzhong Liu, Xi'an Jiaotong Univ. (China)
Yucheng Ding, Xi'an Jiaotong Univ. (China)
Weitao Jiang, Xi'an Jiaotong Univ. (China)
Qin Lian, Xi'an Jiaotong Univ. (China)
Lei Yin, Xi'an Jiaotong Univ. (China)
Yongsheng Shi, Xi'an Jiaotong Univ. (China)
Bingheng Lu, Xi'an Jiaotong Univ. (China)


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