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Journal of Micro/Nanolithography, MEMS, and MOEMS

New opportunities in interferometric lithography using extreme ultraviolet tabletop lasers
Author(s): Przemyslaw W. Wachulak; Lukasz Urbanski; Maria G. Capeluto; D. Hill; Willie S. Rockward; Claudio C. Iemmi; Erik H. Anderson; Carmen S. Menoni; Jorge J. Rocca; Mario C. Marconi
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Paper Abstract

The development of tabletop extreme ultraviolet (EUV) lasers opens now the possibility to realize interferometric lithography systems at EUV wavelengths that easily fit on the top of an optical table. The high degree of spatial and temporal coherence and high brightness of the compact EUV laser sources make them a good option for interferometric applications. The combination of these novel sources with interferometric lithography setups brings to the laboratory environment capabilities that so far had been restricted exclusively to large synchrotron facilities.

Paper Details

Date Published: 1 April 2009
PDF: 7 pages
J. Micro/Nanolith. MEMS MOEMS 8(2) 021206 doi: 10.1117/1.3129837
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 8, Issue 2
Show Author Affiliations
Przemyslaw W. Wachulak, Colorado State Univ. (United States)
Lukasz Urbanski, Colorado State Univ. (United States)
Maria G. Capeluto, Univ. de Buenos Aires (Argentina)
D. Hill, Morehouse College (United States)
Willie S. Rockward
Claudio C. Iemmi, Univ. de Buenos Aires (Argentina)
Erik H. Anderson, Lawrence Berkeley National Lab. (United States)
Carmen S. Menoni, Colorado State Univ. (United States)
Jorge J. Rocca, Colorado State Univ. (United States)
Mario C. Marconi, Colorado State Univ. (United States)

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