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Journal of Micro/Nanolithography, MEMS, and MOEMS

Extreme ultraviolet interference lithography at the Paul Scherrer Institut
Author(s): Vaida Auzelyte; Christian Dais; Patrick Farquet; Detlev A. Gruetzmacher; Laura J. Heyderman; Feng Luo; Sven Olliges; Celestino Padeste; Pratap Sahoo; Tom Thomson; Audrey Turchanin; Christian David; Harun H. Solak
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Paper Abstract

We review the performance and applications of an extreme ultraviolet interference lithography (EUV-IL) system built at the Swiss Light Source of the Paul Scherrer Institut (Villigen, Switzerland). The interferometer uses fully coherent radiation from an undulator source. 1-D (line/space) and 2-D (dot/hole arrays) patterns are obtained with a transmission-diffraction-grating type of interferometer. Features with sizes in the range from one micrometer down to the 10-nm scale can be printed in a variety of resists. The highest resolution of 11-nm half-pitch line/space patterns obtained with this method represents a current record for photon based lithography. Thanks to the excellent performance of the system in terms of pattern resolution, uniformity, size of the patterned area, and the throughput, the system has been used in numerous applications. Here we demonstrate the versatility and effectiveness of this emerging nanolithography method through a review of some of the applications, namely, fabrication of metallic and magnetic nanodevice components, self-assembly of Si/Ge quantum dots, chemical patterning of self-assembled monolayers (SAM), and radiation grafting of polymers.

Paper Details

Date Published: 1 April 2009
PDF: 10 pages
J. Micro/Nanolith. MEMS MOEMS 8(2) 021204 doi: 10.1117/1.3116559
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 8, Issue 2
Show Author Affiliations
Vaida Auzelyte, Paul Scherrer Institut (Switzerland)
Christian Dais, Paul Scherrer Institut (Switzerland)
Patrick Farquet, Paul Scherrer Institut (Switzerland)
Detlev A. Gruetzmacher, Forschungszentrum Jülich GmbH (Germany)
Laura J. Heyderman, Paul Scherrer Institut (Switzerland)
Feng Luo, Paul Scherrer Institut (Switzerland)
Sven Olliges, ETH Zürich (Switzerland)
Celestino Padeste, Paul Scherrer Institut (Switzerland)
Pratap Sahoo
Tom Thomson, The Univ. of Manchester (United Kingdom)
Audrey Turchanin, Univ. Bielefeld (Germany)
Christian David, Paul Scherrer Institut (Switzerland)
Harun H. Solak, Paul Scherrer Institut (Switzerland)

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