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Journal of Nanophotonics

Nanoscale selective growth and optical characteristics of quantum dots on III-V substrates prepared by diblock copolymer nanopatterning
Author(s): Joo Hyung Park; Chi-Chun Liu; Manish K. Rathi; Luke J. Mawst; Paul F. Nealey; Thomas F. Kuech
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Paper Abstract

As an alternate Quantum Dot (QD) fabrication method to self-assembled SK mode QDs, diblock copolymer nano-patterned QDs were investigated. By employing selective growth of QDs on diblock copolymer nano-patterned masks, independence from the problematic wetting layer and controllability on QD size and distribution associated with SK growth mode QDs were realized. The diblock copolymer nano-patterned masks were fabricated using a diblock copolymer template and a dielectric mask, and InxGa1-xAs QDs were selectively grown on patterned GaAs and InP substrates by Metalorganic Chemical Vapor Deposition (MOCVD). The optical properties from diblock copolymer patterned QDs on III-V substrates were investigated at low temperature.

Paper Details

Date Published: 1 January 2009
PDF: 12 pages
J. Nanophoton. 3(1) 031604 doi: 10.1117/1.3085990
Published in: Journal of Nanophotonics Volume 3, Issue 1
Show Author Affiliations
Joo Hyung Park, Univ. of Wisconsin-Madison (United States)
Chi-Chun Liu, Univ. of Wisconsin-Madison (United States)
Manish K. Rathi, Univ. of Wisconsin-Madison (United States)
Luke J. Mawst, Univ. of Wisconsin-Madison (United States)
Paul F. Nealey, Univ. of Wisconsin-Madison (United States)
Thomas F. Kuech, Univ. of Wisconsin-Madison (United States)

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