Share Email Print
cover

Journal of Nanophotonics

Nanoscale selective growth and optical characteristics of quantum dots on III-V substrates prepared by diblock copolymer nanopatterning
Author(s): Joo Hyung Park; Chi-Chun Liu; Manish K. Rathi; Luke J. Mawst; Paul F. Nealey; Thomas F. Kuech
Format Member Price Non-Member Price
PDF $20.00 $25.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

As an alternate Quantum Dot (QD) fabrication method to self-assembled SK mode QDs, diblock copolymer nano-patterned QDs were investigated. By employing selective growth of QDs on diblock copolymer nano-patterned masks, independence from the problematic wetting layer and controllability on QD size and distribution associated with SK growth mode QDs were realized. The diblock copolymer nano-patterned masks were fabricated using a diblock copolymer template and a dielectric mask, and InxGa1-xAs QDs were selectively grown on patterned GaAs and InP substrates by Metalorganic Chemical Vapor Deposition (MOCVD). The optical properties from diblock copolymer patterned QDs on III-V substrates were investigated at low temperature.

Paper Details

Date Published: 1 January 2009
PDF: 12 pages
J. Nanophoton. 3(1) 031604 doi: 10.1117/1.3085990
Published in: Journal of Nanophotonics Volume 3, Issue 1
Show Author Affiliations
Joo Hyung Park, Univ. of Wisconsin-Madison (United States)
Chi-Chun Liu, Univ. of Wisconsin-Madison (United States)
Manish K. Rathi, Univ. of Wisconsin-Madison (United States)
Luke J. Mawst, Univ. of Wisconsin-Madison (United States)
Paul F. Nealey, Univ. of Wisconsin-Madison (United States)
Thomas F. Kuech, Univ. of Wisconsin-Madison (United States)


© SPIE. Terms of Use
Back to Top