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Optical Engineering

Direct femtosecond laser lithography for photoresist patterning
Author(s): Ik-Bu Sohn; Myeong-Jin Ko; Young-Seop Kim; Young-Chul Noh
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Paper Abstract

Development of maskless lithography techniques may solve the problem of photomask cost. Furthermore, it could open a market for small-scale manufacturing applications. Since femtosecond lasers have been found suitable for processing of a wide range of materials with submicrometer resolution, it is attractive to use this technique for maskless lithography. In this paper, we report direct laser writing of lithographic patterns with submicron feature width on thin photoresist film by a femtosecond laser. The patterns were analyzed with a scanning electron microscope. The effects of laser energy and number of pulses on the feature size were investigated. Finally, we present various results on submicron photoresist patterning, which show great potential for future application.

Paper Details

Date Published: 1 February 2009
PDF: 6 pages
Opt. Eng. 48(2) 024301 doi: 10.1117/1.3081094
Published in: Optical Engineering Volume 48, Issue 2
Show Author Affiliations
Ik-Bu Sohn, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Myeong-Jin Ko, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Young-Seop Kim, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Young-Chul Noh, Korea Advanced Institute of Science and Technology (Korea, Republic of)


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