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Journal of Micro/Nanolithography, MEMS, and MOEMS

Successors of ArF Water-Immersion Lithography: EUV Lithography, Multi-e-beam Maskless Lithography, or Nanoimprint?
Author(s): Burn Jeng Lin
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Paper Details

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J. Micro/Nanolith. 7(4) 040101 doi: 10.1117/1.3062205
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 7, Issue 4, October 2008
Show Author Affiliations
Burn Jeng Lin, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)


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